Photoacid-labile polymers and photoresists comprising same
AssigneeShipley Company, L.L.C.
InventorsGeorge G. Barclay, Patrick J. Bolton
Life of this patent
Estimating the term…
Abstract
The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
Claims19
A chemically-amplified positive photoresist composition comprising one or more photoacid generator compounds and a polymer that comprises a structure of the following formula:
- wherein X and Y are the same or different and are each non-hydrogen substituents;
- Aryl is an aromatic group;
- each R is the same or different non-hydrogen substituent;
- R1, R2 and R3 are independently hydrogen or optionally substituted C1-8alkyl;
- m is an integer of zero to 4;
- and n is an integer of from zero to five;
- and a, b and c are mole percents of the each of the depicted units and are each greater than zero,
- wherein (i) the polymer further comprises lactone groups or (ii) the photoresist comprises a further resin comprising acetal photoacid labile groups.
A chemically-amplified positive photoresist composition comprising one or more photoacid generator compounds and a polymer that comprises a structure of the following formula:
- wherein X and Y are each the same or different non-hydrogen substituents;
- Aryl is an aromatic group;
- each R is the same or different non-hydrogen substituent;
- R1, R2 and R3 are independently hydrogen or optionally substituted C1-8alkyl;
- m and m′ are each independently zero to 4;
- and d, e and f are mole percents of the each of the depicted units and are each greater than zero.
Dependencies are inferred from the claim text.