Back to results
US 7,018,939 B2Granted
Micellar technology for post-etch residues
AssigneeMotorola, Inc.
InventorBalgovind K. Sharma
Life of this patent
Estimating the term…
Abstract
A method is provided herein for cleaning a semiconductor device. In accordance with the method, a semiconductor device is provided (11), and a micellar solution is applied (13) to the semiconductor device. The method is particularly useful for cleaning copper and silicon surfaces and removing processing residues from the surfaces of vias or trenches.
Claims24
A method for cleaning a semiconductor device, comprising the steps of:
- providing a semiconductor device having organometallic processing residues on a surface thereof;
- and
- removing the residues through the application of a micellar solution;
- wherein the micellar solution comprises, by weight, about 0.01% to about 1% surfactant, about 1% to about 10% citric acid, and about 1% to about 10% oxalic acid.
1 more element
A method for removing processing residues from a semiconductor substrate, comprising the step of:
- providing a semiconductor substrate having a plurality of openings therein, said openings having a processing residue disposed on a surface thereof;
- and
- applying a micellar solution to the substrate, thereby removing at least a portion of the processing reside from the plurality of openings;
- wherein the micellar solution comprises, by weight, about 0.01% to about 1% hydrocarbon surfactant, about 1% to about 10% citric acid, and about 1% to about 10% oxalic acid.
1 more element
A method for making a semiconductor device, comprising the steps of:
- providing a semiconductor substrate;
- etching a plurality of openings in the semiconductor substrate such that, upon completion of the etch, at least some of the openings have a processing residue disposed on a surface thereof, the processing residue having been formed during the etching process;
- and
- removing at least a portion of the processing residue by contacting the processing residue with a micellar solution;
- wherein the micellar solution comprises, by weight, about 0.01% to about 1% hydrocarbon surfactant, about 1% to about 10% citric acid, and about 1% to about 10% oxalic acid.
2 more elements
Dependencies are inferred from the claim text.