Extending the range of lithographic simulation integrals

A method of extending lithographic simulation integrals to include intermediate-range and long-range distance scales, said method comprising:

• dividing and decomposing at least two mask polygons into sectors made up of triangles having corners and edges;
• performing a distance scale calculation from corners of a plurality of said at least two mask polygons;
• implementing a polygon pinning algorithm;
• performing a triangle convolution of said plurality of mask polygons;
• combining contributions of said sectors to yield a convolution of said plurality of said mask polygons;
• combining said plurality of said mask polygons;
• and
• computing an aerial image for optical proximity correction from said combined sector contributions.

A program storage device readable by a machine, tangibly embodying a program of instructions executable by the machine to perform method steps for performing model-based optical proximity correction, said method steps comprising:

• calculating a finite integral for each sector of a mask polygon having defined corners to determine sector contributions from vertices of said mask polygon;
• integrating on a finite shape in said sector;
• summing up the contribution of said sectors of said mask polygon;
• and
• calculating interaction effects from said finite integral calculation.