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US 7,009,689 B2Granted
Holder of photomask
AssigneeGudeng Precision Industrial Co., Ltd.
InventorMing-Chien Chiu
Life of this patent
Estimating the term…
Abstract
An apparatus suitable for holding a photomask comprises a photomask holder having a plurality of through holes and a plurality of protrusions detachably connected to the photmask holder via the through holes. The photomask is positioned on supporting ridges of the protrusions so that the friction between the protrusions and the photomask is prevented, and the generation of particulates can be effectively reduced.
Claims5
An apparatus suitable for holding a photomask, comprising:
- a photomask holder, having a plurality of through holes;
- and
- a plurality of protrusions, wherein each protrusion is comprised of a PEEK or VESPEL material and one side thereof is inclined to form a cambered surface to serve as a supporting ridge, wherein the protrusions are inserted into the through holes of the photomask holder, and wherein a photomask is disposed on the supporting ridges so that a surface contact area and friction between the supporting ridges and chromium deposition formed at a bottom surface of the photomask are substantially reduced so that generation of particulates due to friction between the protrusions and a chromium deposition formed at a bottom surface of the photomask is substantially reduced.
An apparatus suitable for holding a photomask, comprising:
- a photomask holder, having a plurality of through holes;
- a plurality of protrusions, each with a cambered surface supporting ridge formed at one end thereof, detachably integrated with the photomask holder via the through holes, wherein a photomask is positioned on the supporting ridges;
- and
- a pedestal, formed far away from each supporting ridge, detachably integrated into the through holes of the photomask holder.
1 more element
Dependencies are inferred from the claim text.