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US 7,009,686 B2Granted
Exposure method
AssigneeCanon Kabushiki Kaisha
InventorsMiyoko Kawashima, Kenji Yamazoe
Life of this patent
Estimating the term…
Abstract
An exposure method includes the steps of illuminating a pattern formed on a mask using an illumination system that forms an effective light source having a first part that includes only s-polarized light and a second part that mixes s-polarized light and p-polarized light, and projecting, through a projection optical system, light from the mask onto an object to be exposed.
Claims8
An exposure method for exposing a pattern of a mask onto an object, said method comprising the steps of:
- illuminating the mask using an illumination system that forms an effective light source having a first part that mainly includes s-polarized light and a second part that mixes s-polarized light and p-polarized light, the first and second parts having different light intensities;
- and
- projecting, through a projection optical system having the effective light source at its pupil plane, and a numerical aperture of 0.9 or greater, a pattern of the mask onto an object to be exposed.
Dependencies are inferred from the claim text.