Protective metal structure and method to protect low-K dielectric layer during fuse blow process

A guarded fuse array with improved heat resistance comprising:

• at least one fuse comprising two conductive fuse interconnect structures extending through a first thickness portion of a plurality of dielectric insulating layers to communicate with a semiconductor device;
• the plurality of dielectric insulating layers comprising a lower plurality of dielectric insulating layers and at least an upper dielectric insulating layer;
• the two conductive fuse interconnect structures being electrically interconnected above the at least an upper dielectric insulating layer by a fuse link portion removable by the application of heat to form the at least one fuse;
• a conductive guard ring interconnect structure surrounding the at least one fuse and extending through a second thickness portion of the lower plurality of dielectric insulating layers and the at least an upper dielectric insulating layer;
• and,
• a protective metal portion electrically isolated from the two fuse interconnect structures the protective metal portion formed in the uppermost layer of the lower plurality of dielectric insulating layers and disposed to underlie at least a portion of the fuse link portion.