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US 7,008,734 B2Granted
Phase shift mask
AssigneeHynix Semiconductor Inc.
InventorsChang Moon Lim, Seo Min Kim
Life of this patent
Estimating the term…
Abstract
A phase shift mask, comprising a transparent substrate having a trench-type guard ring pattern for shifting the phase of light transmitted therethrough by 180°; and a half-tone phase shift pattern disposed on the transparent substrate and surrounded by the guard ring pattern is disclosed.
Claims3
A phase shift mask, comprising:
- a transparent substrate having a trench in a guard ring pattern for shifting the phase of light transmitted therethrough by 180°;
- and a half-tone phase shift pattern disposed on the transparent substrate and surrounded by the guard ring pattern.
Dependencies are inferred from the claim text.