Shutter disk and blade for physical vapor deposition chamber

A shutter disk for covering a substrate support in a physical vapor deposition chamber comprising:

• a disk body having a center axis and defined by an outer edge, a top surface extending to the outer edge and a lower surface disposed opposite the top surface, wherein the lower surface further comprises:
• a center pad extending from the lower surface;
• a blind hole having outwardly flaring sides formed in the center pad along the center axis of the disk body;
• a lip extending from the lower surface proximate the outer edge, the lip extending below the center pad to a lip face that is parallel to the center pad;
• and
• an annular recess formed in the lower surface between the center pad and lip.

A physical vapor deposition chamber comprising:

• a chamber body having sidewalls and a bottom defining a process volume;
• a substrate support;
• a housing sealingly coupled to the chamber body;
• a disk body having a center axis and defined by an outer edge, a top surface extending to the outer edge and a lower surface disposed opposite the top surface, wherein the lower surface further comprises a center pad extending from the lower surface and a lip extending from the lower surface proximate the outer edge, the lip extending below the center pad;
• a robot having a blade adapted to move the disk body between the housing and chamber body;
• and
• an alignment feature disposed between the center pad and the blade, wherein the alignment feature engages the disk body along the center axis.

A physical vapor deposition chamber comprising:

• a chamber body having sidewalls and a bottom defining a process volumes wherein a slot is formed through one of the sidewalls;
• a shutter disk mechanism at least partially disposed in the process volume and having a robot blade and a shutter disk engaged by an alignment feature, the alignment feature disposed along a center axis of the shutter disk, wherein the shutter disk has a lower surface comprising:
• a center pad near the center axis;
• and
• a lip extending along an outer edge of the shutter disk and extending below the center pad;
• and
• a housing sealingly coupled to the chamber body.

A method for positioning a shutter disk within a physical vapor deposition chamber having a substrate support, comprising:

• spacing a shutter disk vertically from a substrate support;
• moving a robot blade between the substrate support and the shutter disk;
• and
• engaging the shutter disk and the robot blade by coupling a post disposed on the robot blade with an alignment feature disposed along a center axis of the shutter disk.

A physical vapor deposition chamber comprising:

• a chamber body having sidewalls and a bottom defining a process volume;
• a shutter disk mechanism at least partially disposed in the process volume and having a robot blade and a shutter disk engaged by an alignment feature, the alignment feature disposed along a center axis of the shutter disk;
• a slot formed through one of the sidewalls;
• a housing sealingly coupled to the chamber body;
• and
• at least a first sensor disposed adjacent to the housing and orientated to detect the presence of a portion of the shutter disk mechanism within the housing.

A method for positioning a shutter disk within a physical vapor deposition chamber having a substrate support, comprising:

• spacing a shutter disk vertically from a substrate support;
• moving a robot blade between the substrate support and the shutter disk;
• engaging the shutter disk and the robot blade with an alignment feature disposed along a center axis of the shutter disk;
• and
• setting the shutter disk on a perimeter of the substrate support wherein center portions of the shutter disk and substrate support remain in a spaced-apart relation.