Apparatus for coating photoresist

An apparatus for coating photoresist on a surface of a substrate during a semiconductor device manufacturing process, the apparatus comprising:

• a vacuum chuck capable of holding a substrate thereon by using vacuum;
• a driving motor connected to the vacuum chuck through an arm in order to supply rotational driving force to the substrate;
• a first nozzle installed above the vacuum chuck in order to coat photoresist onto the substrate;
• a second nozzle installed below the vacuum chuck in order to perform a rinse process with respect to a rear surface of the substrate;
• a bath surrounding the vacuum chick including the substrate in order to prevent photoresist from being discharged to an exterior;
• a first drain pipe connected to both lower ends of the bath in order to discharge photoresist contained in the bath;
• a vane, coupled to said arm, forcing air in said bath toward said first drain pipe;
• and
• a photoresist discharge section coupled to said first drain pipe to temporarily store photoresist introduced into the bath.