Method and apparatus for supplying a source gas

A method for supplying a source gas and a purge gas to a processing chamber for forming a film on a substrate in the processing chamber, the method comprising:

• a) heating a carrier gas;
• b) heating a purge gas;
• c) heating a liquid source disposed in a container;
• d) bubbling the heated carrier gas in the heated liquid source to form a vapor source;
• e) supplying a source gas including the vapor source and the heated carrier gas into the processing chamber;
• and
• f) supplying the heated purge gas into the processing chamber to purge the processing chamber.

An apparatus for supplying a source gas and a purge gas to a processing chamber for forming a film on a substrate in the processing chamber, the source gas including a carrier gas and a vapor source, the apparatus comprising:

• a) a hot gas generator to heat the carrier gas and to heat the purge gas;
• b) a container to hold a liquid source;
• c) a carrier gas supplying line configured to bubble the heated carrier gas in the liquid source to form the vapor source;
• d) a source gas supplying line to supply the source gas including the vapor source and the heated carrier gas into the processing chamber;
• and
• e) a purge gas supplying line to supply the heated purge gas into the processing chamber to purge the processing chamber.

An apparatus for supplying a first source gas and a second source gas to a processing chamber for forming first and second films, respectively, on a substrate in the processing chamber, the first source gas including a first carrier gas and a first vapor source, the second source gas including a second carrier gas and a second vapor source, the first vapor source having a first vapor pressure at a prescribed temperature and the second vapor source having a second vapor pressure at room temperature, the apparatus comprising:

• a) a hot gas generator operative to selectively heat the first carrier gas relative to the second carrier gas;
• b) a first container to hold the first liquid source;
• c) a second container to hold the second liquid source;
• d) a first carrier gas supplying tube configured to bubble the first carrier gas selectively heated by the hot gas generator in the first liquid source to form the first vapor source;
• e) a second carrier gas supplying tube configured to bubble the second carrier gas in the second liquid source to form the second vapor source;
• f) a first source gas supplying tube to supply the first source gas including the first vapor source and the heated first carrier gas from the first container into the processing chamber;
• and
• g) a second source gas supplying tube to supply the second source gas including the second vapor source and the second carrier gas from the second container into the processing chamber.

A method for supplying a source gas to a processing chamber for forming a film on a substrate in the processing chamber, the method comprising:

• a) heating a carrier gas;
• b) bubbling the heated carrier gas in a liquid source disposed in a container to form a vapor source;
• c) supplying a source gas including the vapor source and the heated carrier gas into the processing chamber for forming the film;
• d) heating a purge gas;
• and
• e) supplying the heated purge gas into the processing chamber to purge the processing chamber after forming the film.