Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorArno J. Bleeker
Life of this patent
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Abstract
A lithographic apparatus includes a patterning device that patterns a projected beam. The patterning device includes an array of cells that contain a polar fluid, a non-polar fluid, and an electrode. A potential difference across the electrode and the polar fluid causes displacement of the non-polar fluid. Based on a difference in refractive index between the polar fluid and the non-polar fluid, a beam of light which passes through the cell will have its phase changed in dependence on the relative thickness on the polar and non-polar fluids and on their refractive indices.
Claims10
A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
- a patterning array including individually controllable elements that impart the projection beam with a pattern, each of the individually controllable elements include a cell containing a polar fluid, a non-polar fluid, an electrode, and a voltage source;
- a substrate table that supports a substrate during an exposure operation;
- and
- a projection system that projects the patterned beam onto a target portion of the substrate.
A device manufacturing method, comprising:
- forming each of individually controllable elements in an array of individually controllable elements with a cell containing a polar fluid, a non-polar fluid, an electrode, and a voltage source;
- using the array of individually controllable elements to impart a projection beam with a pattern;
- and
- projecting the patterned beam of radiation onto a target portion of a substrate.
Dependencies are inferred from the claim text.