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US 7,002,164 B2Granted
Source multiplexing in lithography
AssigneeIntel Corporation
InventorsMichael Goldstein, Peter J. Silverman
Life of this patent
Estimating the term…
Abstract
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
Claims6
A method comprising:
- scanning substantially parallel beams of light across a patterned portion of a mask during a lithographic imaging operation, wherein the beams are distinct and each beam is generated by a different one of a plurality of sources, and wherein the substantially parallel beams of light illuminate different portions of the mask while being scanned across the mask.
Dependencies are inferred from the claim text.