Chemical vapor deposition material and chemical vapor deposition

A chemical vapor deposition material represented by the following formula (1):

• Ru3++LnXmYl (1)
• wherein L is a ligand represented by the following formula (2):
• wherein R1, R2 and R3 are each independently a hydrogen atom, fluorine atom, trifluoromethyl group or hydrocarbon group having 1 to 10 carbon atoms,
• X is a hydrogen anion, halogen anion, monovalent hydrocarbon anion having 1 to 10 carbon atoms or ligand represented by the following formula (3):
• wherein R4, R5, R6, R7 and R8 are each independently a hydrogen atom, hydrocarbon group having 1 to 10 carbon atoms or trimethylsilyl group, with the proviso that when at least two out of R4, R5, R6, R7 and R8 are hydrocarbon groups having 1 to 10 carbon atoms, they may be bonded together to form a 4- to 8-membered ring,
• Y is a ligand represented by the following formula (4):
• where in R9, R10, R11, R12, R13 and R14 are each independently a hydrogen atom or hydrocarbon group having 1 to 10 carbon atoms,
• n is an integer of 1 to 3, m is an integer of 0 to 2, l is 0 or 1, and (n+m) is 3.