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US 7,001,695 B2Granted
Multiple alternating phase shift technology for amplifying resolution
AssigneeLSI Logic Corporation
InventorsEbo H. Croffie, Christopher Neville
Life of this patent
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Abstract
A method and apparatus for improving resolution in photolithography. The method includes steps of mapping a first phase onto a first mask, mapping a second phase onto a second mask, and mapping a trim onto the first mask or second mask (or both). Specifically, the first mask may include Phase1 mapped to 0/180 phase, and the second mask may include Phase2 and trim mapped to 0/180 phase. A set of masks consistent with the foregoing is provided.
Claims10
A method of forming a set of masks, said method comprising:
- mapping Phase 1 of an alternating phase shift onto a first mask;
- mapping Phase 2 of an alternating phase shift onto a second mask;
- and mapping a trim onto at least one of said first mask and said second mask.
A set of masks comprising:
- a first mask having Phase 1 of an alternating phase shift mapped thereon;
- a second mask having Phase 2 of an alternating phase shift mapped thereon, at least one of said first and second masks having a trim mapped thereon.
Dependencies are inferred from the claim text.