Cleaning process for photomasks
AssigneeRenesas Technology Corp.
InventorsKoji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yasutaka Kikuchi, Yuki Oomasa, Koichi Kido
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Abstract
A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S122). After completion of these cleaning steps, the photomask is dried (S124).
Claims3
A cleaning process for a photomask provided with a light-shielding coating on a surface of a glass substrate, which comprises the following steps of:
- providing a halftone photomask having a MoSi light-shielding coating;
- cleaning said photomask with O3 gas solved water, wherein said O3 gas solved water has been prepared to be acidic;
- eliminating contamination adhered on a surface of said photomask;
- and
- drying said photomask.
Dependencies are inferred from the claim text.