Methods to improve resolution of cross sectioned features created using an ion beam
AssigneeASML Netherlands B.V.
InventorsTodd J. Davis, Theodore Allen Paxton
Life of this patent
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Abstract
Methods for creating a cross section of at least one feature located on a substrate are disclosed. The methods include coating the feature with a layer of contrast enhancing material, recoating the feature with a second material that is different from the contrast enhancing material, and milling the feature. The second material has substantially similar milling characteristics as the feature. The methods may further include creating an image of the feature and saving the image of the feature.
Claims30
A method for creating a cross section of at least one feature located on a substrate, the method comprising:
- coating the feature with a layer of contrast enhancing material;
- recoating the feature with a second material different from the contrast enhancing material, the second material having substantially similar milling characteristics as the feature;
- and
- milling the feature.
The method of claim 10, wherein milling the feature comprises using a precursor gas.
A method for creating a cross section of at least one feature located on a substrate, the method comprising:
- patterning the substrate with the feature, the feature comprising a first resist material;
- coating the feature with a layer of conducting material;
- recoating the feature with a second resist material;
- and
- milling the feature.
A method for creating a cross section of at least one feature located on a substrate, the method comprising:
- patterning the substrate with the feature, the feature comprising a first dielectric material;
- coating the feature with a layer of conducting material;
- recoating the feature with a second dielectric material;
- and
- milling the feature.
A method for creating a cross section of at least one feature located on a substrate, the method comprising:
- patterning the substrate with the feature, the feature comprising a first conducting material;
- coating the feature with a layer of dielectric material;
- recoating the feature with a second conducting material;
- and
- milling the feature.
Dependencies are inferred from the claim text.