SPM sensor and process for producing it
AssigneeNanoWorld AG
InventorStefan Lutter
Life of this patent
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Abstract
SPM sensor comprising a holding element, cantilever and a sensor tip, which projects out of the surface of the cantilever, at the free end of the cantilever, at least the cantilever and the three-surface sensor tip consisting of monocrystalline (100)-silicon, and a process for producing this sensor. The process is distinguished by inexpensive process steps, substantially wet-chemical etching steps. The result is that an SPM sensor with a rectangular cantilever arm having a tip which may or may not project beyond the free end is produced from a single piece.
Claims6
A monolithic SPM sensor (20, 120) comprising a holding element (4, 104), cantilever (17, 117) and a three-surface sensor tip (18, 118), which projects out of a surface of the cantilever at a free end of the cantilever, wherein the holding element (4, 104), the cantilever (17, 117) and the three surface sensor tip (18, 118) are made from one monocrystalline (100)-silicon, wherein the cantilever (17, 117) is made from the monocrystalline (100)-silicon with an arm region (21, 121), which is substantially rectangular when seen from above;
- and an adjoining triangular tip region (22, 122) which tapers to a point, the tip region (22, 122) being formed by inclined, slow-etching crystal planes (10, 11;
- 110, 111), which are produced by wet-chemical means, wherein the tip region includes an angle of approximately 62°, and a sensor tip (18, 118), which is arranged on the top side of the cantilever (17, 117), is made from (100)-silicon and comprises three surfaces, of which two surfaces (10, 11;
- 110, 111) face away from the cantilever (17, 117) and one surface (19, 119) faces toward the arm region (21, 121), the two surfaces being defined by the two inclined, slow-etching crystal planes (10, 11;
- 110, 111), and the one third surface (19, 119) being defined by a (111)-crystal plane.
Dependencies are inferred from the claim text.