Method and apparatus for generating gas to a processing chamber

An apparatus for generating gas for a processing system, comprising:

• a hollow body;
• a gas inlet formed in the hollow body;
• a tube disposed in the hollow body and coupled to the gas inlet
• a gas outlet formed in the hollow body;
• a plurality of first spacing elements disposed within the hollow body;
• a plurality of second spacing elements disposed within the hollow body and defining an interstitial space with the first spacing elements, the second spacing elements distinctly different and separately identifiable from the first spacing elements;
• and
• a solid precursor material at least partially filling the interstitial space.

Apparatus for generating gas for a processing system, comprising:

• a carrier gas source;
• a processing chamber;
• a first gas line coupled between the processing chamber and the carrier gas source;
• a canister coupled in-line with the first gas line;
• a solid precursor material disposed within the canister and adapted to produce a process gas via a sublimation process;
• and
• a first heater disposed upstream of the canister and adapted to heat the carrier gas flowing into the canister to at least about a predetermined level.

Apparatus for generating gas for a processing system, comprising:

• a carrier gas source;
• a processing chamber;
• a first gas line coupled between the processing chamber and the carrier gas source;
• a second gas line coupled in parallel to the first gas line between the processing chamber and the carrier gas source;
• a canister coupled in-line with the first gas line;
• a plurality of first spacing elements disposed within the canister;
• a plurality of second spacing elements disposed within the canister, the second spacing elements, larger, distinct different and separately identifiable from the first spacing elements;
• a solid precursor material disposed within the canister and adapted to produce a gas vapor when exposed to a temperature above a predetermined level;
• a first heater disposed between the canister and carrier gas source, and adapted to heat the carrier gas flowing into the canister to at least about the predetermined level;
• a second heater adapted to heat carrier gas flowing in the second gas line;
• and
• a means for diverting gas between the first gas line and the second gas line.

Apparatus for generating gas for a processing system, comprising:

• a container adapted for use in a gas panel of a processing system;
• a lid coupled to the container, the lid having a first port and a second port;
• a plurality of first spacing elements disposed within the canister;
• a plurality of second spacing elements disposed within the canister and defining an interstitial space with the first spacing elements, the first and second spacing elements having different mean diameters;
• the second spacing elements distinctly different and separately identifiable from the first spacing elements;
• and
• a solid precursor material at least partially filling the interstitial space and adapted to produce a gas vapor when exposed to a temperature above a predetermined level at a predetermined pressure.

A method for generating gas for a semiconductor processing chamber, comprising:

• heating a carrier gas flowing in a first gas line;
• flowing the heated carrier gas into a canister containing a solid precursor material;
• and
• generating a process gas from the solid precursor material by sublimation.

A method for generating gas for a semiconductor processing chamber, comprising:

• heating gas flowing through a first gas line;
• flowing the heated gas through a canister to sublime a process gas from a solid precursor material contained in the canister;
• reducing the temperature of the gas flowing through the canister to limit process gas generation;
• closing a valve disposed between the canister and processing chamber to prevent process gas from exiting the canister;
• heating gas flowing through a second gas line, the second gas line teed to the first gas line between the valve and the processing chamber;
• and
• purging residual process gas between the tee and processing chamber with the heated gas from the second gas line.

A method for charging a gas generation canister, the method comprising:

• intermixing a solid precursor material with a plurality of first spacing elements and a plurality of second spacing elements, the second spacing elements distinctly different and separately identifiable from the first spacing elements;
• disposing the intermixed spacing elements and precursor material into a canister;
• and
• sealing the canister to prevent leakage of gas therefrom.