Residue and scum reducing composition and method
AssigneeShipley Company, L.L.C.
InventorsDaniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut
Life of this patent
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Abstract
A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
Claims10
A composition comprising one or more tristyrylphenol alkoxylates in combination with one or more alkyl glycosides in sufficient amounts to reduce or prevent residue and scum formation on a substrate or in a solution.
A composition consisting of one or more tristyrylphenol alkoxylates, one or more alkyl glycosides, one or more auxiliary surfactants, one or more antifoam agents, one or more alkaline components, and water.
A method comprising contacting a substrate or solution containing photolithographic material with a composition comprising one or more tristyrylphenol alkoxylates in combination with one or more alkyl glycosides in sufficient amounts to reduce or prevent residue and foam formation.
Dependencies are inferred from the claim text.