Manufacturing method for photomask
AssigneeHoya Corporation
InventorFumiaki Higashi
Life of this patent
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Abstract
A manufacturing method for a photomask includes a step of performing a writing operation at a predetermined scanning unit in a direction in which a head of a writing system is to be scanned (Y direction) and at a predetermined overrun unit in a direction perpendicular to the scanning direction (X direction). A pattern of the photomask includes a cyclic pattern. The writing step includes a step of writing pattern units (e.g., pixel units 20) under identical overrun conditions (e.g., a grid head 17a is aligned with the left end of each pixel unit 20 such that writing is commenced from the left end of each pixel unit 20), the pattern units including identical cyclic patterns.
Claims17
A manufacturing method for a photomask including a step of performing a writing operation at a predetermined scanning unit in a direction in which a head of a writing system is to be scanned (Y direction) and at predetermined overrun units in a direction perpendicular to the scanning direction (X direction), wherein
- a pattern of the photomask includes a cyclic pattern;
- and
- the writing step includes a step of writing pattern units including a uniform cyclic pattern under identical overrun conditions.
A manufacturing method for a photomask including a step of performing a writing operation at a predetermined scanning unit in a direction in which a head of a writing system is to be scanned (Y direction) and at a predetermined overrun unit in a direction perpendicular to the scanning direction (X direction), wherein a photomask of the pattern includes a cyclic pattern section formed from acyclic pattern and a normal pattern section formed from another pattern;
- and, in the writing step, the cyclic pattern section and the normal pattern section are written in different writing steps, and the cyclic pattern is written such that pattern units including identical cyclic patterns are produced under identical overrun conditions and/or identical scanning conditions.
A manufacturing method for a photomask including a writing step of performing a writing operation on a writing unit of a writing apparatus having a predetermined X length and a predetermined Y length, wherein
- a pattern of the photomask includes a cyclic pattern,
- the writing step includes a step of writing pattern units including identical cyclic patterns under the same writing conditions by means of matching X and Y lengths of each pattern unit with X and Y lengths of a writing unit;
- a writing mode is a raster scanning type in which a beam is scanned over an entire writing area;
- and
- a Y length of the writing unit is a scanning unit for the head of the writing system, and an X length of the writing unit is a unit at which the photomask is to be fed in a direction perpendicular to the direction Y.
Dependencies are inferred from the claim text.