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US 6,887,626 B2Granted
Electron beam projection mask
AssigneeNEC Electronics Corporation
InventorFumihiro Koba
Life of this patent
Estimating the term…
Abstract
The batch projection regions and of an electron beam projection mask are arranged so that pattern density may be equalized on the whole wafer surface.
Claims9
An electron beam projection mask for use in forming a plurality of high density and low density batch projection regions on a semiconductor substrate so that pattern density may be equalized all over said semiconductor substrate,
- wherein said high density and low density batch projections are equal in area.
Dependencies are inferred from the claim text.