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US 6,887,357 B2Granted
Sputtering system
AssigneeLG. Philips LCD Co., Ltd.
InventorSoo Chang Chang
Life of this patent
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Abstract
A sputtering system for depositing a thin film on a substrate includes a vacuum chamber, a support for supporting the substrate in the vacuum chamber, a target arranged to oppose the support, a fixed plate formed on a first side of the target, and a plurality of electromagnets formed on the fixed plate in a cell pattern.
Claims16
A sputtering system for depositing a thin film on a substrate, comprising:
- a vacuum chamber;
- a support for supporting the substrate in the vacuum chamber;
- a target arranged to oppose the support;
- a fixed plate formed on a first side of the target;
- and
- a plurality of electromagnets formed having different geometrical group cell patterns on the fixed plate,
- wherein at least two of the geometrical group cell patterns have electromagnets of different geometrical shapes, respectively.
4 more elements
Dependencies are inferred from the claim text.