Method and installation for etching a substrate
AssigneeASM International N.V.
InventorsHessel Sprey, Arjen Benjamin Storm, Jan Willem Hubert Maes
Life of this patent
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Abstract
Method for etching a substrate wherein, after placing in an etching chamber, said substrate is treated with a mixture of HF and acetic acid. Acetic acid is introduced into the chamber first, followed by the hydrogen fluoride. Hydrogen fluoride is introduced via an intermediate stage during which the hydrogen fluoride is stored in an auxiliary chamber. By this means back-flow of a corrosive mixture consisting of hydrogen fluoride and acetic acid into the piping assembly for hydrogen fluoride is prevented and, thus, the life of the piping assembly concerned is appreciably prolonged and metal contamination on substrate treated later is prevented.
Claims19
An installation for etching a substrate by simultaneous exposure to two etching gases, the two etching gases forming a corrosive mixture, the installation, comprising:
- an etching chamber for a substrate, the etching chamber having an opening;
- a piping system coupled to the opening and providing for at least a first fluid feed and a second fluid feed, wherein the first fluid feed is connected at a source end to a source of a first etching gas, wherein the second fluid feed is connected at a source end to a source of a second etching gas, and wherein the first and second fluid feeds are configured to separately provide the first and second etching gases to the etching chamber via the piping system;
- an auxiliary chamber positioned within the piping system and having an inlet and an outlet, wherein the inlet includes a first controllable shut-off valve and is in communication with the first fluid feed, wherein the outlet includes a second controllable shut-off valve and is in communication with the etching chamber, and wherein said first and second shut-off valves are configured to be open only one at a time;
- and
- a third controllable shut-off valve positioned in the piping system in the second fluid feed, wherein the third shut-off valve and the second shut-off valve are configured to be open only one at a time,
- wherein the walls of auxiliary chamber and the walls of piping system upstream of the auxiliary chamber are each formed of different materials.
A system for etching a substrate, comprising:
- an etching chamber for the substrate;
- a piping system in fluid communication with the etching chamber and having at least a first fluid feed and a second fluid feed, wherein the first fluid feed is connected at a source end to a source of a first etching gas, wherein the second fluid feed is connected at a source end to a source of a second etching gas;
- an auxiliary chamber positioned within the piping system and having an inlet and an outlet, wherein the inlet includes a first controllable shut-off valve and is in gas communication with the first fluid feed and the outlet includes a second controllable shut-off valve and is in gas communication with the etching chamber;
- a third controllable shut-off valve positioned in the piping system in the second fluid feed;
- means for preventing diffusion of the second etching gas through the inlet of the auxiliary chamber by opening the first and second shut-off valves only one at a time and by opening the second and the third shut-off valves only one at a time:
- and
- wherein walls of the auxiliary chamber and walls of the piping system upstream of the auxiliary chamber are each formed of different materials.
Dependencies are inferred from the claim text.