Method and system for coating and developing

A coating and developing treatment system for performing coating and developing treatment comprising:

• a coating treatment unit is configured to form a resist film on a substrate;
• a developing treatment unit configured to develop the substrate;
• a heating/cooling unit comprising a heat plate configured to continuously heat and a cooling plate configured to continuously cool in one casing the substrate on which the resist film has been formed by the coating treatment unit;
• and
• a gas nozzle configured to supply a treatment gas to the resist film formed on the substrate to form a protective film on a surface of the resist film,
• wherein the gas nozzle is disposed on a cooling plate side in the heating/cooling unit,
• wherein the gas nozzle is configured to supply the treatment gas after cooling at the cooling plate before an exposure of the substrate, and
• wherein the gas nozzle is configured to move to a position above the substrate on the cooling plate after cooling at the cooling plate, to supply the treatment gas.