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US 6,856,376 B2Granted
Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsGert-Jan Heerens, Sjoerd Nicolaas Lambertus Donders, Franciscus Andreas Cornelis Johannes Spanjers, Aschwin Lodewijk Hendricus Johannes Van Meer, Thomas Josephus Maria Castenmiller
Life of this patent
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Abstract
In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.
Claims23
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;
- a substrate table for holding a substrate;
- and
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- and
- a cleaning device constructed and arranged to clean a component of the lithographic apparatus in situ, the cleaning device comprising:
- a contaminant liberating device constructed and arranged to use electromagnetic fields to liberate contaminants from a surface of the component to be cleaned;
- and
- a contaminant removal device constructed and arranged to remove liberated contaminants from the apparatus.
7 more elements
A method of cleaning a lithographic apparatus, comprising:
- using a cleaning device integrated into the lithographic apparatus to clean a component thereof, the cleaning device constructed and arranged to use electromagnetic fields to liberate particles from a surface of the component to be cleaned.
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- using a cleaning device integrated into a lithographic apparatus to clean a component thereof, the cleaning device constructed and arranged to use electromagnetic fields to liberate particles from a surface of the component to be cleaned.
Dependencies are inferred from the claim text.