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US 6,855,466 B2Granted
Planarizing antireflective coating compositions
AssigneeShipley Company, L.L.C.
InventorsEdward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
Life of this patent
Estimating the term…
Abstract
The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
Claims18
A coated substrate comprising:
- a substrate having thereon:
- a coating layer of an antireflective composition, the antireflective composition comprising a plasticizer compound and a polymer having a molecular weight (Mw) of about 8,000 or less,
- wherein the plasticizer compound has a Mw of about 2,000 or less and is chosen from among a phenyl or benzyl substituted anthracene compound, a compound of having multiple aryl substitution, and a phenolic compound;
- and
- a coating layer of a chemically-amplified positive photoresist composition over the antireflective layer.
2 more elements
A coated substrate comprising:
- a substrate having thereon:
- a coating layer of an antireflective composition, the antireflective composition comprising a plasticizer compound that has a Mw of about 2,000 or less and is chosen from among a phenyl or benzyl substituted anthracene compound, a compound of having multiple aryl substitution, and a phenolic compound;
- and
- a coating layer of a chemically-amplified positive photoresist composition over the antireflective layer.
1 more element
Dependencies are inferred from the claim text.