Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices

A method of exposing a resist on a substrate comprising the steps of:

• a) providing the substrate with a film of resist;
• b) placing the substrate on a stage;
• c) providing x-ray radiation from a point source;
• d) using an inline collimator to collimate said x-ray radiation;
• e) providing a mask for defining exposure of said resist;
• f) illuminating said mask with said x-ray radiation after said collimating step (d);
• and
• g) exposing said resist with x-ray radiation passing through said mask;
• h) sensing position of the substrate with a displacement sensor wherein displacement sensor comprises a differential variable reluctance transducer (DVRT).

A method of exposing a resist on a substrate comprising the steps of:

• a) providing the substrate with a film of resist;
• b) placing the substrate on a stage;
• c) providing x-ray radiation from a point source;
• d) collimating said x-ray radiation;
• e) providing a mask for defining exposure of said resist;
• f) illuminating said mask with said x-ray radiation after said collimating step (d);
• g) exposing said resist with x-ray radiation passing through said mask;
• and
• h) sensing position of the substrate with a displacement sensor wherein said displacement sensor comprises a differential variable reluctance transducer (DVRT).

A method of exposing a resist on a substrate comprising the steps of:

• a) providing the substrate with a film of resist;
• b) placing the substrate on a stage;
• c) providing x-ray radiation from a point source;
• d) using an inline concentrator to concentrate said x-ray radiation;
• e) providing a mask for defining exposure of said resist;
• f) illuminating said mask with said x-ray radiation after said concentrating step (d);
• and
• g) exposing said resist with x-ray radiation passing through said mask;
• h) sensing position of the substrate with a displacement sensor wherein displacement sensor comprises a differential variable reluctance transducer (DVRT).

A method of exposing a resist on a substrate comprising the steps of:

• a) providing the substrate with a film of resist;
• b) placing the substrate on a stage;
• c) providing x-ray radiation from a point source;
• d) concentrating said x-ray radiation;
• e) providing a mask for defining exposure of said resist;
• f) illuminating said mask with said x-ray radiation after said concentrating step (d);
• g) exposing said resist with x-ray radiation passing through said mask;
• and
• h) sensing position of the substrate with a displacement sensor wherein said displacement sensor comprises a differential variable reluctance transducer (DVRT).