Method of producing thermal-developable photosensitive material
AssigneeFuji Photo Film Co., Ltd.
InventorJunpei Iwado
Life of this patent
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Abstract
A method of producing a thermal-developable photosensitive material is provided, which prevents mixing of materials between layers to ensure that the coating surface is in a good condition. In this method, liquids for forming a photosensitive layer, an intermediate layer and a protective layer are simultaneously applied in a multilayer form on a substrate to produce a thermal-developable photosensitive material. A pH of the intermediate layer coating liquid is adjusted within a range from 5 to 10 and a viscosity of the intermediate layer coating liquid is adjusted within a range from 20 to 150 mPa·s. Moreover, a pH buffering salt is added to the intermediate layer coating liquid.
Claims4
A method of producing a thermal-developable photosensitive material obtained by forming, on a substrate, a photosensitive layer, a protective layer for protecting a surface of the photosensitive layer, and an intermediate layer between the photosensitive layer and the protective layer, wherein a pH of a coating liquid forming the intermediate layer is set within a range from 6 to 9, wherein a viscosity of a coating liquid forming the intermediate layer is set within a range from 40 to 100 mPa·s.
Dependencies are inferred from the claim text.