Exposure apparatus and control method therefor, and semiconductor device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorOsamu Ogawa
Life of this patent
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Abstract
An exposure apparatus which operates based on a set of parameters contained in a parameter file. The apparatus includes an acquiring section which acquires a first parameter file containing a first set of parameters, a converting section which converts the first parameter file acquired by the acquiring section into a second parameter file containing a second set of parameters, the second set of parameters corresponding to a version of a software used in the exposure apparatus, and a setting section which sets a value of a parameter contained in the second parameter file obtained by the converting section, based on a configuration file which describes a value of the parameter contained in the second parameter file.
Claims9
An exposure apparatus which operates based on a set of parameters contained in a parameter file, said apparatus comprising:
- an acquiring section which acquires a first parameter file containing a first set of parameters;
- a converting section which converts the first parameter file acquired by said acquiring section into a second parameter file containing a second set of parameters, the second set of parameters corresponding to a version of software used in said exposure apparatus;
- and
- a setting section which sets a value of a parameter contained in the second parameter file obtained by said converting section, based on a configuration file which describes a value of the parameter contained in the second parameter file.
A parameter file generating method adapted for an exposure apparatus which operates based on a set of parameters contained in a parameter file, said method comprising steps of:
- acquiring a first parameter file containing a first set of parameters;
- converting the first parameter file acquired in said acquiring step into a second parameter file containing a second set of parameters, the second set of parameters corresponding to a version of software used in the exposure apparatus;
- and
- setting a value of a parameter contained in the second parameter file obtained in said converting step, based on a configuration file which describes a value of the parameter contained in the second parameter file.
A program which causes a computer to execute a method of generating a parameter file, the parameter file containing a set of parameters and being used in an exposure apparatus, said method comprising steps of:
- acquiring a first parameter file containing a first set of parameters;
- converting the first parameter file acquired in said acquiring step into a second parameter file containing a second set of parameters, the second set of parameters corresponding to a version of software used in the exposure apparatus;
- and
- setting a value of a parameter contained in the second parameter file obtained in said converting step, based on a configuration file which describes a value of the parameter contained in the second parameter file.
Dependencies are inferred from the claim text.