Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product

A method of checking a target pattern in a device forming region on a mask, the method comprising:

• selecting, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target patter is performed;
• setting the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• detecting the target pattern based on the alignment reference coordinates;
• and
• checking the target pattern detected.

A method of correcting or processing a pattern in a device forming region on a mask, the method comprising:

• selecting, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at a barycenter pattern in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed;
• setting the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• detecting the target pattern based on the alignment reference coordinates;
• and
• correcting or processing the target pattern detected.

A device detecting a target pattern in a device forming region on a mask, the device comprising:

• an alignment reference setting unit which
• selects, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at a barycenter of the pattern in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed, and
• sets the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• and
• a target pattern detecting unit which detects the target pattern based on the alignment reference coordinates.

A device detecting a target pattern in a device forming region on a mask, the device comprising:

• an alignment reference setting unit which
• selects, from among a group patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at barycenters of the pattern in first and second directions, the barycenter position not being displaced form a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed, and
• sets the barycenter position of the alignment pattern as alignment reference coordinates;
• and
• a target pattern detecting unit which detects the target pattern based on the alignment reference coordinates.

A device checking a target pattern in a device forming region on a mask, the device comprising:

• an alignment reference setting unit which
• selects, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at a barycenter of the pattern in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed, and
• sets the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• a target pattern detecting unit which detects the target pattern based on the alignment reference coordinates;
• and
• a checking unit which checks the target pattern detected.

A device correcting or processing a pattern in a device forming region on a mask, the device comprising:

• an alignment reference setting unit which
• selects, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at a barycenter of the pattern in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed, and
• sets the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• a target pattern detecting unit which detects the target pattern based on the alignment reference coordinates;
• and
• a correcting/processing unit which corrects or processes the target pattern detected.

A computer program containing instructions which when executed on a computer causes the computer to perform the steps of:

• selecting, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at a barycenter of the pattern in a first direction, the barycenter position not being displaced from a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed,
• setting the barycenter position of the alignment pattern in the first direction as alignment reference coordinates;
• and
• detecting the target pattern based on the alignment reference coordinates.

A computer program containing instructions which when executed on a computer causes the computer to perform the steps of:

• selecting, from among a group of patterns included in a region near the target pattern, the region being in the device forming region, a pattern having a barycenter position at barycenters of the pattern in first and second directions, the barycenter position not being displaced form a predetermined barycenter even if the patterns are deformed when the patterns are formed on the mask, as an alignment pattern in the device forming region, the alignment pattern for setting a position at which the detection of the target pattern is performed, and
• setting the barycenter position of the alignment pattern as alignment reference coordinates;
• and
• detecting the target pattern based on the alignment reference coordinates.