Automatic exposing apparatus and method for exposing both sides of works

An automatic exposing apparatus for exposing a work substrate having first and second sides, the automatic exposing apparatus comprising:

• a first exposing mechanism having a first mask;
• a second exposing mechanism having a second mask;
• a carrying-in portion for providing the work substrate to said first exposing mechanism;
• a carrying-out portion for receiving the work substrate from said second exposing mechanism;
• a first holder for closely fixing the work substrate thereto and placing the first side of the work substrate in contact with the first mask so that the first side of the work substrate faces said first exposing mechanism;
• a first optical system for exposing the first side of the work substrate when the work substrate is closely fixed to said first holder and in contact with the first mask;
• a second holder for closely fixing the work substrate thereto and placing the second side of the work substrate in contact with the second mask so that the second side of the work substrate faces said second exposing mechanism;
• and
• a second optical system for exposing the second side of the work substrate when the work substrate is closely fixed to said second holder and in contact with the second mask,
• wherein at least one of said first holder and said second holder is movable directly towards the other of said first holder and said second holder, and wherein said first and second holders are movable to simultaneously contact the work substrate.