Projection exposure system

A projection exposure system positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width δλabout a central working wavelength λ, wherein a relative width δλ/λof the wavelength band is larger than 0.002, comprising:

• at least a first, second, third, fourth and fifth lens group which are successively positioned in this order between the first and the second object along an optical axis and each of which comprises a plurality of lenses, wherein the first third and fifth lens group each has a positive refractive power and the second and fourth lens group each has a negative refractive power, and wherein the fifth lens group is a lens group which is positioned closest to the second object,
• wherein each lens is made of a material having an Abbe number V=(N(x)-1)/N(x-Δλ))-N(x+Δλ), wherein N(x) is a refractive index of the material at a wavelength x, and Δλis a wavelength difference, and wherein the material is selected from at least two material groups, namely a first material group whose materials have Abbe numbers (V1) which are higher than a lint value (Vg), and a second material group whose materials have Abbe numbers (V2) which are lower than the limit value (Vg), wherein at least one of the lenses is made of a material of the first material group and has a positive refractive power and at least one of the lenses is made of a material of the second material group and has a negative refractive power,
• wherein lenses of the fourth lens group are made of materials which are included in the second material group and whose refractive index at a wavelength of 365.5 nm is smaller than 1.59.

A projection exposure system positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width δλabout a central working wavelength λ, wherein a relative width δλ/λof the wavelength band is larger than 0.002, comprising:

• at least a first, second, third, fourth and fifth lens group which are successively positioned in this order between the first and the second object along an optical axis and each of which comprises a plurality of lenses, wherein the first, third and fifth lens group each has a positive refractive power and the second and fourth lens group each has a negative refractive power, and wherein the fifth lens group is a lens group which is positioned closest to the second object, wherein each lens is made of a material having an Abbe number V=(N(x)-1)/N(x-Δλ))-N(xΔλ), wherein N(x) is a refractive index of the material at a wavelength x, and Δλis a wavelength difference, and wherein the material is selected from at least two material groups, namely a first material group whose materials have Abbe numbers (V1) which are higher than a limit value (Vg), and a second material group whose materials have Abbe numbers (V2) which are lower than the limit value (Vg), wherein at least one of the lenses is made of a material of the first material group and has a positive refractive power and at least one of the lenses is made of a material of the second material group and has a negative refractive power,
• wherein all lenses of at least one of the first, second, third and fourth lens group are made of materials which are contained in the first material group, and wherein at least one lens of at least one of the first, second, third and fourth lens group comprises at least one aspherical surface.

A projection exposure system positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width δλabout a central working wavelength λ, wherein a relative width δλ/λof the wavelength band is larger than 0.002, comprising:

• at least a first, second, third, fourth and fifth lens group which are successively positioned in this order between the first and the second object along an optical axis and each of which comprises a plurality of lenses, wherein the first, third and fifth lens group each has a positive refractive power and the second and fourth lens group each has a negative refractive power, and wherein the fifth lens group is a lens group which is positioned closest to the second object,
• wherein each lens is made of a material having an Abbe number V=(N(x)1)/N(xΔλ))-N(xΔλ), wherein N(x) is a refractive index of the material at a wavelength x, and Δλis a wavelength difference, and wherein the material is selected from at least two material groups, namely a first material group whose materials have Abbe numbers (V1) which are higher than a limit value (Vg), and a second material group whose materials have Abbe numbers (V2) which are lower than the limit value (Vg), wherein at least one of the lenses is made of a material of the first material group and has a positive refractive power and at least one of the lenses is made of a material of the second material group and has a negative refractive power,
• wherein the lens group disposed closest to the second object comprises at least one pseudo-cemented lens pair, wherein the pseudo-cemented lens pair is formed of a pair of directly adjacent lenses whose lens surfaces which are oriented towards each other are spaced apart from each other at all points in the direction of the optical axis by a distance A which is smaller than 2.5 percent of a free diameter of a larger one of the two lenses, and wherein a first lens of the lens pair is made of a material of the first material group and has a positive refractive power and a second lens of the lens pair is a lens made of a material of the second material group and has a negative refractive power.