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US 6,806,496 B2Granted
Display device and manufacturing method for the same
AssigneeSeiko Epson Corporation
InventorSatoshi Inoue
Life of this patent
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Abstract
In a manufacturing method in which a source line is provided around a pixel electrode provided on a substrate, an insulating film having open regions that will provide a source and a gate is formed, the source and the drain are formed, and a semiconductor film and a gate are provided on the source and drain, the above constituents are formed substantially under atmospheric pressure. Since manufacture can be accomplished substantially under the atmospheric pressure, no special apparatus, such as a vacuum chamber, is required, permitting a display device to be manufactured at lower cost.
Claims9
A display device comprising:
- a pixel electrode;
- a transistor conductively connected to the pixel electrode, the transistor including:
- a first opening region, a drain of the transistor being formed therein;
- a second opening region, a source of the transistor being formed therein, and
- a semiconductor film formed over the drain;
- and the source, wherein the first and the second opening region are separated by an insulating material, and the drain and the source are made from liquid material with conductivity.
3 more elements
Dependencies are inferred from the claim text.