Method and structure for contacting an overlying electrode for a magnetoelectronics element
AssigneeFreescale Semiconductor, Inc.
InventorsBrian R. Butcher, Kenneth H. Smith, Clarence J. Tracy
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Abstract
A method for contacting an electrically conductive electrode overlying a first dielectric material of a structure is provided. The method includes forming a mask layer overlying the electrically conductive electrode and patterning the mask layer to form an exposed electrically conductive electrode material. At least a portion of the exposed electrically conductive electrode material is removed while an electrically conductive veil is formed adjacent the mask layer. A metal contact layer is formed such that said metal contact layer contacts the electrically conductive veil.
Claims16
A method for contacting an electrically conductive electrode overlying a first dielectric material of a structure, the method comprising the steps of:
- forming a mask layer overlying the electrically conductive electrode;
- patterning said mask layer to form an exposed electrically conductive electrode material;
- removing at least a portion of said exposed electrically conductive electrode material while forming an electrically conductive veil adjacent said mask layer;
- and
- forming a metal contact layer such that said metal contact layer contacts said electrically conductive veil.
A method for contacting an electrode for a magnetoelectronics element that is electrically connected to the electrode the magnetoelectronics element having a first magnetic layer overlying a tunnel barrier layer that overlies a second magnetic layer, the method comprising the steps of;
- forming a mask layer overlying the electrode;
- patterning said mask layer to form an exposed electrode material;
- removing at least a portion of said exposed electrode material while forming an electrically conductive veil adjacent said mask layer;
- forming a dielectric material layer overlying said electrically conductive veil;
- and
- removing a portion of said dielectric material layer to expose an area of said electrically conductive veil sufficient for electrical contact.
Dependencies are inferred from the claim text.