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AssigneeCorning Incorporated
InventorsDouglas C. Allan, Nicholas F. Borrelli, Charlene M. Smith, Robert W. Sparrow
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The invention provides a UV below 200 nm lithography method utilizing mixed calcium strontium fluoride crystals. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed calcium strontium cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of calcium strontium cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals, optical element blanks thereof and optical lithography elements.
A Method of making a mixed fluoride crystal optical element blank for less than 200 nm wavelength optics, said method including:
A Method of making a mixed fluoride crystal optical element blank for less than 200 nm wavelength optics, said method including:
Dependencies are inferred from the claim text.