High-resolution photosensitive resin composition usable with i-line and method of forming pattern

A method of forming a pattern with i-line as an exposure light source by use of a radiation sensitive resin composition comprising an alkali-soluble resin and a quinonediazide group-containing photosensitizer wherein the alkali-soluble resin is a mixture of a novolak resin and one or more resins selected from (i) polyacrylate polymerized with an acrylic ester monomer (ii) polymethacrylate polymerized with a methacrylic ester monomer (iii) a polystyrene derivative, and (iv) a copolymer consisting of two or more monomer units selected from acrylic ester, methacrylic ester, a styrene derivative and an organic acid monomer;

• wherein said acrylic ester is a monomer unit selected from a group consisting of methyl acrylate, ethyl acrylate, n-propyl acrylate, n-butyl acrylate, n-hexyl acrylate, isopropyl acrylate, isobutyl acrylate, t-butyl acrylate, cyclohexyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, methyl-α-chloroacrylate, and phenyl α-bromoacrylate;
• and, further wherein methacrylic ester is a monomer unit selected from a group consisting of methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, n-butyl methacrylate, n-hexyl methacrylate, isopropyl methacrylate, isobutyl methacrylate, t-butyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, 1-phenylethyl methacrylate, 2-phenylethyl methacrylate, furfuryl methacrylate, diphenylmethyl methacrylate, pentachlorophenyl methacrylate, naphthyl methacrylate, iso-boronyl methacrylate, and benzyl methacrylate.