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US 6,805,907 B2Granted
Method and apparatus for vapor generation and film deposition
AssigneeMSP Corporation
InventorsJames J. Sun, Benjamin Y. H. Liu
Life of this patent
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AssigneeMSP Corporation
InventorsJames J. Sun, Benjamin Y. H. Liu
Estimating the term…
A vapor generator (19, 62) and connected chemical vapor deposition chamber (28) for providing a vapor for operations such as chemical vapor deposition has an atomizer (16, 16A, 38, 50) for forming an aerosol or droplet spray (36, 58, 74, 80) separate from a vaporization chamber (19, 62). The aerosol is passed into a heated vaporization chamber (19, 62) wherein the particles or droplets are flash vaporized and larger droplets are vaporized by direct contact with heated surfaces. The resulting gas/vapor stream is then used for chemical vapor deposition, in a separate chemical vapor deposition chamber (26). The vapor and gas stream is preferably passed through a restricted passageway (22, 44, 68) for mixing before being introduced into the chemical vapor deposition chamber (26).
A method of forming a vapor and gas mixture for chemical vapor deposition having a vapor of a known reagent therein comprising the steps of forming an aerosol of a liquid containing the reagent, introducing the aerosol into a heated enclosure to vaporize the liquid reagent, causing the gas and vapor formed to flow as a gas mixture out from the vaporization chamber, and into a separate CVD chamber for chemical vapor deposition, and passing the gas mixture from the vaporization chamber through a restriction causing turbulent mixing of the gas mixture before the gas mixture is introduced into the CVD chamber.
A method of forming a vapor and gas mixture for chemical vapor deposition having a vapor of a known reagent therein comprising the steps of forming an aerosol of a liquid containing the reagent, introducing the aerosol into a heated enclosure to vaporize the liquid reagent, causing the gas and vapor formed to flow as a gas mixture cut from the vaporization chamber, and into a separate chemical vapor deposition (CVD) chamber for chemical vapor deposition, sensing the pressure of the CVD chamber, and controlling the gas mixture flow into the CVD chamber in order to maintain the CVD chamber at a desired pressure.
Dependencies are inferred from the claim text.