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US 6,805,466 B1Granted
Lamphead for a rapid thermal processing chamber
AssigneeApplied Materials, Inc.
InventorJoseph M. Ranish
Life of this patent
Estimating the term…
Abstract
A lamphead includes a monolithic member. A plurality of lamp receptacles and reflector cavities are formed in the monolithic member.
Claims40
A lamphead for use in semiconductor processing, comprising:
- a monolithic member;
- and
- a plurality of lamp receptacles and reflector cavities formed in the monolithic member, each lamp receptacle adapted to support a lamp and each reflector cavity shaped to act as a reflector for the lamp.
A lamphead assembly for use in semiconductor processing, comprising:
- a lamphead;
- a plurality of lamp receptacles and reflector cavities formed in the lamphead, each lamp receptacle adapted to support a lamp and each reflector cavity shaped to act as a reflector for the lamp;
- at least one lampholder having receptacles for outer leads of a lamp;
- a ferrofluid;
- and
- one or more magnets disposed about the lampholder and maintaining position of the ferrofluid near the receptacles;
- such that when outer leads of a lamp are inserted into the lamphold receptacles, the ferrofluid surrounds the outer leads thereby suppressing arcing between the outer leads.
4 more elements
A semiconductor processing system, comprising:
- a process chamber having a support on which a substrate may be positioned during processing;
- and
- a monolithic lamphead having a plurality of lamp receptacles and reflector cavities formed therein, each lamp receptacle adapted to support a lamp and each reflector cavity shaped such that the lamps direct radiant energy onto a substrate on the support.
A semiconductor processing system, comprising:
- a process chamber having a support on which a substrate may be positioned during processing;
- a lamphead having a plurality of lamp receptacles and reflector cavities formed therein, each lamp receptacle adapted to support a lamp and each reflector cavity shaped such that the lamps direct radiant energy onto a substrate on the support;
- at least one lampholder having receptacles for outer leads of a lamp;
- a ferrofluid;
- and
- one or more magnets disposed about the lampholder and maintaining position of the ferrofluid near the receptacles;
- such that when outer leads of a lamp are inserted into the lampholder receptacles, the ferrofluid surrounds the outer leads thereby suppressing arcing between the outer leads.
4 more elements
An apparatus for processing a substrate, comprising:
- a process chamber having a support on which a substrate may be positioned during processing;
- and
- a monolithic lamphead having a plurality of lamp receptacles and reflector cavities formed therein, each lamp receptacle adapted to support a lamp and the reflector cavities shaped such that the lamps direct radiant energy onto a substrate on the support.
An apparatus for processing a substrate, comprising:
- a process chamber having a support on which a substrate may be positioned during processing;
- a lamphead having a plurality of lamp receptacles and reflector cavities formed therein, each lamp receptacle adapted to support a lamp and the reflector cavities shaped such that the lamps direct radiant energy onto a substrate on the support;
- at least one lampholder having receptacles for outer leads of a lamp;
- a ferrofluid;
- and
- one or more magnets disposed about the lampholder and maintaining position of the ferrofluid near the receptacles;
- such that when outer leads of a lamp are inserted into the lampholder receptacles, the ferrofluid surrounds the outer leads thereby suppressing acrcing between the leads.
4 more elements
Dependencies are inferred from the claim text.