Method, system and holder for transferring templates during imprint lithography processes

An imprint lithography system comprising:

• an imprint head;
• a motion stage disposed opposite to said imprint head, said motion stage including a wafer chuck;
• a template having first and second opposed sides, with said first side having a mold pattern thereon;
• and
• a template transfer system coupled to said motion stage, said template transfer system including a template transfer holder having a body and support members extending from said body away from said motion stage, with said support members being configured to contact said first side and secure said template to said template transfer holder while maintaining said mold pattern spaced-apart from said body.

A holder for an imprint lithography template having first and second opposed surfaces, with a mold pattern extending from said second surface, said holder comprising:

• a body having first and second opposed sides;
• a plurality of support members extending from said first side configured to support said second surface;
• a plurality of spaced-apart tines extending from said first side away from said second side;
• and
• a vacuum system in fluid communication with said support members to apply a vacuum to said second surface to fixedly attach said plurality of support members, with said plurality of support members adapted to limit movement between said template and said body in a Z direction, while allowing movement therebetween in an X-Y plane, with said plurality of tines configured to guide said template upon said support members and selectively clamp against said template.