Method of and apparatus for processing substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorMasahiro Kimura
Life of this patent
Estimating the term…
Abstract
In a substrate processing apparatus for use in performing a reduced-pressure pull up drying method, a liquid drainage pipe (46) for draining a drainage liquid containing an organic solvent from a processing chamber (26) including therein a processing bath (10) for rinsing a substrate (W) with water is provided with a buffer tank (50) inserted therein for separation between the drainage liquid and an organic solvent vapor. A vapor discharge pipe (62) is connected in communication with an interior space of the buffer tank, and is provided with pressure regulating valves (64a, 64b) inserted therein for regulating pressure in the processing chamber at a fixed pressure higher than atmospheric pressure.
Claims12
An apparatus for performing predetermined processing on a substrate, comprising:
- a substrate exposing section for exposing a substrate from pure water stored in a processing bath disposed in a processing chamber;
- a vapor supply section for supplying a water-soluble organic solvent vapor to said substrate;
- an evacuating section for evacuating an interior of said processing chamber;
- and
- a pressure regulating section for regulating pressure in said processing chamber at a fixed pressure when said organic solvent vapor is supplied to said substrate, said fixed pressure being higher than atmospheric pressure and remaining within a limit for maintenance of supply of said organic solvent vapor.
A method of performing predetermined processing on a substrate, comprising the steps of:
- immersing a substrate in pure water stored in a processing bath within a processing chamber to rinse said substrate with said pure water;
- exposing said substrate rinsed with said pure water from said pure water;
- supplying a water-soluble organic solvent vapor to said substrate when exposing said substrate from said pure water;
- placing an interior of said processing chamber under reduced pressure to dry said substrate after the supply of said organic solvent vapor;
- and
- regulating pressure in said processing chamber at a fixed pressure when said organic solvent vapor is supplied to said substrate, said fixed pressure being higher than atmospheric pressure and remaining within a limit for maintenance of supply of said organic solvent vapor.
An apparatus for performing predetermined processing on a substrate, comprising:
- substrate exposing means for exposing a substrate from pure water stored in a processing bath disposed in a processing chamber;
- vapor supply means for supplying a water-soluble organic solvent vapor to said substrate;
- evacuating means for evacuating an interior of said processing chamber;
- and
- pressure regulating means for regulating pressure in said processing chamber at a fixed pressure when said organic solvent vapor is supplied to said substrate, said fixed pressure being higher than atmospheric pressure and remaining within a limit for maintenance of supply of said organic solvent vapor.
Dependencies are inferred from the claim text.