Devices and methods for detecting orientation and shape of an object
AssigneeASM International N.V.
InventorsMartien Johan De Haas, Hermanus Jozef Clemens Maria Terhorst, Erik Ter Vrugt, Theo De Keyzer
Life of this patent
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Abstract
Embodiments of the present invention provide a system and method for receiving and dropping-off a horizontally oriented flat substrate, for example a semiconductor wafer, on a substrate support structure and verifying the correct positioning and orientation (level) of the substrate. Additional embodiments provide a system and method for indicating the presence or absence, orientation and concavity or convexity of a substrate.
Claims55
A substrate support and sensing apparatus for use in semiconductor processing, comprising:
- a first substrate support structure, the first support structure comprising at least one fluid channel configured to supply fluid to an underside of a substrate supported over the first support structure;
- at least one sensor configured to measure a property of gas flow beneath the supported substrate and provide a signal indicative of the value of said property;
- and
- a controller monitoring the signal generated by the sensor, the controller producing an indication of whether the substrate is oriented level relative to the first support structure.
A method of supporting and sensing a substrate for use in semiconductor processing, comprising:
- supporting a substrate over a first support structure, said structure comprising at least one fluid channel in communication with a gap between the first support structure and an underside of the supported substrate;
- flowing fluid through the fluid channel;
- measuring a property of the fluid beneath the supported substrate;
- and
- using the measured property to determine one or more of an orientation of the substrate with respect to the first support structure and a shape of the substrate.
A system for sensing a condition of a substrate over a support structure, the method comprising:
- a substrate holder having an upper surface extending beneath a substrate supported thereover, the upper surface including a recess configured to accommodate the substrate therein;
- at least one fluid injection channel which breaches the upper surface to inject fluid into a gap between the substrate and upper surface;
- a fluid pressure sensor configured to measure pressure beneath the substrate;
- and
- a controller connected to the pressure sensor and configured to read the pressure sensed by the pressure sensor;
- wherein the controller is configured to compare the sensed pressure to a plurality of empirically determined pressure ranges associated with a corresponding plurality of substrate conditions to thereby determine a condition of the substrate based upon the sensed pressure.
A substrate supporting and sensing apparatus, comprising
- a support structure for receiving and supporting a substantially horizontally oriented substrate;
- a substrate sensing structure provided with at least three gas channels, the gas channels configured to inject gas at spaced apart positions against a lower surface of a substrate supported on the support structure above the substrate sensing structure, each of the gas channels provided with a sensor configured to generate a sensor signal relating to a property of gas flow through the channel;
- and
- a controller connected to the sensors, the controller configured to read, for each of the sensors, the sensor signal, while the substrate is supported on the support structure, the controller producing from sensor readings an indication of an orientation of a substrate relative to the support structure.
Dependencies are inferred from the claim text.