Illumination device, exposure apparatus and exposure method

An illumination device for a scanning exposure apparatus for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, said device comprising:

• an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• means for driving said optical member based on the obtained condition,
• wherein a pattern for driving said optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern of the acceleration interval or the driving pattern of the deceleration interval of the stage.

An illumination device for a scanning exposure apparatus for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, said device comprising:

• an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein said illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of said illumination-distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically irrespective of acceleration and deceleration of the stage.

An exposure apparatus comprising:

• an illumination device for controlling an illumination distribution;
• a stage for holding substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein said illumination-distribution varying means has a function for varying the phase of the illumination distribution of each pulsed light in accordance with the acceleration in the acceleration interval, the deceleration in the deceleration interval, or a velocity in a constant velocity interval of the movable stage.

An exposure apparatus comprising:

• an illumination device for controlling an illumination distribution;
• a stage for holding substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• (iii) means for driving said optical member based on the obtained correction,
• wherein a pattern for driving said optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern of the acceleration interval or the driving pattern of the deceleration interval of the stage.

An exposure apparatus comprising:

• an illumination device for controlling an illumination distribution;
• a stage for holding substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for temporarily varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein said illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of said illumination-distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically.

An exposure method comprising:

• a step of controlling an illumination device that controls an illumination distribution;
• a stage control step of holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a step of setting a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein the illumination-distribution varying means has a function for varying the phase of the illumination distribution of each pulsed light in accordance with the acceleration in the acceleration interval, the deceleration in the deceleration interval, or a velocity in a constant velocity interval of the movable stage.

An exposure method comprising:

• a step of controlling an illumination device that controls an illumination distribution;
• a stage control step of holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a step of setting a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• (ii) an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• (iii) means for driving said optical member, based on the obtained condition,
• wherein a pattern for driving the optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern in the acceleration interval or the driving pattern in the deceleration interval of the stage.

An exposure method comprising:

• a step of controlling an illumination device that controls an illumination distribution;
• a stage control step of holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a step of setting a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein the illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of the illuminating-distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically.

A method of manufacturing a semiconductor device, said method comprising the steps of:

• placing a plurality of semiconductor manufacturing apparatus, inclusive of an exposure apparatus, in a plant for manufacturing semiconductor devices;
• and
• manufacturing a semiconductor device using the plurality of semiconductor manufacturing apparatus,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein the illumination-distribution varying means has a function for varying the phase of the illumination distribution of each pulsed light in accordance with the acceleration in the acceleration interval, the deceleration in the deceleration interval, or a velocity in a constant velocity interval of the movable stage.

A method of manufacturing a semiconductor device, said method comprising the steps of:

• placing a plurality of semiconductor manufacturing apparatus, inclusive of an exposure apparatus, in a plant for manufacturing semiconductor devices;
• and
• manufacturing a semiconductor device using the plurality of semiconductor manufacturing apparatus,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• (ii) an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• (iii) means for driving the optical member based on the obtained condition,
• wherein a pattern for driving the optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern in the acceleration interval or the driving pattern in the deceleration interval of the stage.

A method of manufacturing a semiconductor device, said method comprising the steps of:

• placing a plurality of semiconductor manufacturing apparatus, inclusive of an exposure apparatus, in a plant for manufacturing semiconductor devices;
• and
• manufacturing a semiconductor device using the plurality of semiconductor manufacturing apparatus,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure based on the obtained condition,
• wherein the illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of the illumination distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically.

A semiconductor manufacturing plant, comprising:

• a plurality of semiconductor manufacturing apparatus, inclusive of an exposure apparatus;
• a local-area network for interconnecting said plurality of semiconductor manufacturing apparatus;
• and
• a gateway for connecting said local-area network and an external network outside said plant,
• said exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing exposure, based on the obtained condition,
• wherein said illumination-distribution varying means has a function for varying the phase of the illumination distribution of each pulsed light in accordance with the acceleration in the acceleration interval, the deceleration in the deceleration interval, or a velocity in a constant velocity interval of the movable stage.

A semiconductor manufacturing plant, comprising:

• a plurality of semiconductor manufacturing apparatus, inclusive of an exposure apparatus;
• a local-area network or interconnecting said plurality of semiconductor manufacturing apparatus;
• and
• a gateway for connecting said local-area network and an external network outside said plant,
• said exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• (ii) an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• (iii) means for driving said optical member based on the obtained condition,
• wherein a pattern for driving said optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern in the acceleration interval or the driving pattern in the deceleration interval of the stage.

A semiconductor manufacturing plant, comprising:

• a plurality of semiconductor manufacturing apparatus inclusive of an exposure apparatus;
• a local-area network or interconnecting said plurality of semiconductor manufacturing apparatus;
• and
• a gateway for connecting said local-area network and an external network outside said plant,
• said exposure apparatus comprising:
• an illumination optical device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by said illumination device, onto the substrate,
• said illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illuminating distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein said illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of said illumination-distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically.

A method of maintaining an exposure apparatus, said method comprising the steps of:

• preparing a database, which is for storing information relating to maintenance of the exposure apparatus, on an external network outside a plant in which the exposure apparatus is installed;
• connecting the exposure apparatus to a local-area network within the plant;
• and
• maintaining the exposure apparatus, based upon information that is stored in the database, utilizing the external network and the local-area network,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure based on the obtained condition,
• wherein the illumination-distribution varying means has a function for varying the phase of the illumination distribution of each pulsed light in accordance with the acceleration in the acceleration interval, the deceleration in the deceleration interval, or a velocity in a constant velocity interval of the movable stage.

A method of maintaining an exposure apparatus, said method comprising the steps of:

• preparing a database, which is for storing information relating to maintenance of the exposure apparatus, on an external network outside a plant in which the exposure apparatus is installed;
• connecting the exposure apparatus to a local-area network within the plant;
• and
• maintaining the exposure apparatus, based upon information that is stored in the database, utilizing the external network and the local-area network,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• (ii) an optical member for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure;
• and
• (iii) means for driving the optical member based on the obtained condition,
• wherein a pattern for driving the optical member is decided based upon results of measuring the illumination distribution corresponding to the driving pattern in the acceleration interval or the driving pattern in the deceleration interval of the stage.

A method of maintaining an exposure apparatus, said method comprising the steps of:

• preparing a database, which is for storing information relating to maintenance of the exposure apparatus, on an external network outside a plant in which the exposure apparatus is installed;
• connecting the exposure apparatus to a local-area network within the plant;
• and
• maintaining the exposure apparatus, based upon information that is stored in the database, utilizing the external network and the local-area network,
• the exposure apparatus including:
• an illumination device for controlling an illumination distribution;
• a stage for holding a substrate, driving the substrate to a predetermined position and positioning the substrate at the predetermined position;
• and
• a projection optics unit for projecting a pattern, which is illuminated by the illumination device, onto the substrate,
• the illumination device, which is for carrying out exposure even when a movable stage is being accelerated by acceleration in an acceleration interval or decelerated by deceleration in a deceleration interval, including:
• (i) an illumination measurement unit for measuring illumination of pulsed light on a surface of a wafer mounted on the movable stage, wherein the illumination measurement unit is used to obtain a condition in order to control an illumination distribution within an illumination area in accordance with a driving pattern of the movable stage, including the acceleration interval and the deceleration interval;
• and
• (ii) illumination-distribution varying means for varying a phase of the illumination distribution for each pulsed light within the illumination area of an illumination unit that is for performing the exposure, based on the obtained condition,
• wherein the illumination-distribution varying means varies the phase of the illumination distribution based on the obtained condition of a changing rate of a velocity or an angular velocity of the illumination-distribution varying means, which is less than the acceleration in the acceleration interval or the deceleration in the deceleration interval of the movable stage, and varies the phase of the illumination distribution of the illumination unit periodically.