Gas insulated gate field effect transistor
OwnerMark E. Murrayinventor
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OwnerMark E. Murrayinventor
Estimating the term…
The present invention relates to a gas insulated gate field effect transistor and a fabricating method thereof which provides an improved insulator between the gate and the source-drain channel of a field effect transistor. The insulator is a vacuum or a gas filled trench. As compared to a conventional MOSFET, the gas insulated gate device provides reduced capacitance between the gate and the source/drain region, improved device reliability and durability, and improved isolation from interference caused by nearby electric fields. The present invention includes the steps of forming a doped source region and drain region on a substrate, forming a gate, forming a gaseous gate insulating trench and forming terminals upon the gate, the source region and the drain region. A plurality of the devices on a single substrate may be combined to form an integrated circuit.
A gas insulated gate field effect transistor comprising:
An integrated circuit comprising:
Dependencies are inferred from the claim text.