Spin, rinse, and dry station with adjustable nozzle assembly for semiconductor wafer backside rinsing

A spin, rinse, and dry station for spin rinsing a semiconductor wafer, comprising:

• a bowl having a bottom wall and a sidewall;
• a rotational member disposed in said bowl, said rotational member being attached to a rotatable shaft;
• a plurality of support members attached to said rotational member, said support members being configured to support a semiconductor wafer above said rotational member;
• a motor for rotating said rotatable shaft;
• and
• an adjustable nozzle assembly mounted in said bowl, said adjustable nozzle assembly being positioned so as to direct a spray of liquid toward a center of a bottom side of a semiconductor wafer supported in said bowl, wherein the adjustable nozzle assembly is disposed in an opening in the bottom wall of the bowl and includes
• a connector tube having a first end and a second end, an outer surface of said connector tube being threaded;
• a first cap having an opening therethrough, said first cap having a top surface and a threaded inner surface, and said first cap being threaded onto said first end of said connector tube;
• a second cap having an opening therethrough, said second cap having a top surface and a threaded inner surface, said second connector cap being threaded onto said second end of said connector tube;
• and
• a nozzle having a tubular portion defining a channel, said tubular portion being disposed in said opening of said first connector cap so that a position of said nozzle can be horizontally and rotationally adjusted.

A spin, rinse, and dry station, comprising:

• a bowl having a bottom wall and a sidewall;
• a rotational member disposed in said bowl, said rotational member being attached to a rotatable shaft;
• a plurality of support members attached to said rotational member;
• a transparent wafer supported above said rotational member by said plurality of support members;
• a motor for rotating said rotatable shaft;
• and
• an adjustable nozzle assembly mounted in said bowl, said adjustable nozzle assembly being positioned so as to direct a spray of liquid toward a center of a bottom side of said transparent wafer.