Correcting a mask pattern using multiple correction grids

A system for correcting a mask pattern, comprising:

• a database operable to store a record associated with an uncorrected pattern, the uncorrected pattern comprising a plurality of segments, the record associating each segment with a correction grid of a plurality of correction grids comprising a fine grid and a coarse grid, each correction grid comprising a plurality of points;
• and
• a correction module coupled to the database and operable to:
• select a segment;
• determine an optimal correction for the segment;
• determine a correction grid associated with the segment;
• and
• snap the segment to a subset of points of the associated correction grid, the subset of points proximate to the optimal correction, to form a corrected pattern of a mask pattern.

A system for correcting a mask pattern, comprising:

• means for accessing a record associated with an uncorrected pattern, the uncorrected pattern comprising a plurality of segments, the record associating each segment with a correction grid of a plurality of correction grids comprising a fine grid and a coarse grid, each correction grid comprising a plurality of points;
• means for selecting a segment;
• means for determining an optimal correction for the segment;
• means for determining a correction grid associated with the segment;
• and
• means for snapping the segment to a subset of points of the associated correction grid, the subset of points proximate to the optimal correction, to form a corrected pattern of a mask pattern.

A method for correcting a mask pattern, comprising:

• accessing a record associated with an uncorrected pattern, the uncorrected pattern comprising a plurality of segments, the record associating each segment with a correction grid of a plurality of correction grids, each correction grid comprising a plurality of points, the plurality of correction grids comprising a fine grid and a coarse grid, the fine grid associated with a more precise correction, the coarse grid associated with a less precise correction, the corrected pattern associated with a fracture grid having an interval that is a greatest common divisor of an interval of the fine grid and an interval of the coarse grid;
• repeating the following for each segment of the plurality of segments:
• selecting a segment;
• determining an optimal correction for the segment;
• determining a correction grid associated with the segment;
• and
• snapping the segment to a subset of points of the associated correction grid, the subset of points proximate to the optimal correction, to form a corrected pattern of a mask pattern by:
• if the segment is associated with the fine grid, snapping the segment to a subset of points nearest to the optimal correction;
• and
• if the segment is associated with the coarse grid:
• snapping the segment to a subset of points that enlarges a space region if the segment defines the space region, snapping the segment to a subset of points that widens a line region if the segment defines the line region, and snapping the segment to a subset of points nearest to the optimal correction otherwise.