Polarization measurement device and method

A polarization measuring device for measuring the polarization effect on a photoresist during photolithography, said polarization measuring device comprising:

• a light source;
• a reticle positioned below said light source;
• an opaque frame having a single aperture, said opaque frame positioned below said reticle;
• a lens positioned below said opaque frame;
• and
• a wafer having said photoresist on a surface of said wafer, said wafer positioned below said lens, said aperture allowing no more than a first light ray to pass from said light source through said reticle and said lens onto a first surface point on said photoresist;
• wherein said aperture further allows no more than a second light ray to pass from said light source through said reticle and said lens onto a second surface point on said photoresist, said second surface point different from said first surface point, and wherein said photoresist at said first point absorbs a first amount of light, and said photoresist at said second point absorbs a second amount of light, wherein said light source is determined to be randomly polarized if said first amount of light is the same as said second amount of light.