Method, system, and apparatus for management of reaction loads in a lithography system
AssigneeASML Holding N.V.
InventorDaniel N. Galburt
Life of this patent
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Abstract
A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
Claims34
A lithography system, comprising:
- an isolated structure supported by a non-isolated structure, wherein said isolated structure supports a moveable stage;
- a linear motor that includes a first linear motor element and a second linear motor element, wherein said first linear motor element is coupled to the moveable stage;
- a plurality of flexure plates that mount said second linear motor element on said isolated structure;
- and
- a flexure rod coupled between the non-isolated structure and said second linear motor element.
A reaction load management apparatus in a lithography system that includes a linear motor and an isolated structure, wherein the isolated structure is supported by a non-isolated structure, wherein the isolated structure supports a moveable stage, wherein the linear motor includes a first linear motor element and a second linear motor element, wherein the first linear motor element is coupled to the moveable stage, the apparatus including:
- a plurality of flexure plates that mount the second linear motor element on the isolated structure;
- and
- a flexure rod coupled between the non-isolated structure and the second linear motor element.
A reaction load management apparatus in a lithography system that includes a linear motor and an isolated structure, wherein the isolated structure is supported by a non-isolated structure, wherein the isolated structure supports a moveable stage, wherein the linear motor includes a first linear motor element and a second linear motor element, wherein the first linear motor element is coupled to the moveable stage, the apparatus including:
- a flexure mechanism that mounts the second linear motor element on the isolated structure;
- and
- a flexure rod coupled between the non-isolated structure and the second linear motor element.
A method for assembling a lithography system, comprising the steps of:
- (a) supporting a moveable stage on an isolated structure;
- (b) coupling a first linear motor element of a linear motor to the moveable stage;
- (c) mounting a second linear motor element of the linear motor on the isolated structure with a plurality of flexure plates;
- and
- (d) coupling a flexure rod between the non-isolated structure and the second linear motor element.
Dependencies are inferred from the claim text.