Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography

A projection exposure system, in particular for microlithography, for producing an image in an image plane of an object arranged in an object plane wherein the system comprises:

• a light source emitting a projection light bundle, with at least one projection optics arranged in an optical path between its object plane and its image plane and with at least one optical correction component arranged in said optical path in front of the image plane, which in order to change optical image properties in the projection is coupled to at least one correction manipulator in such a way that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally, wherein the correction manipulator co-operates with a correction sensor device in order to determine the optical image properties in the projection, said correction sensor device comprising:
• a) a light source that emits at least one measuring light bundle that traverses at least a part of the projection optics and that lies in front of the entry to the projection optics and behind the exit from the projection optics outside the projection light bundle, and
• b) a position-sensitive correction sensor element for detecting the wave front of the at least one measuring light bundle,
• wherein the correction sensor device comprises an adjustment manipulator for the adjustment of the correction sensor device relative to the projection optics.

A projection exposure system, in particular for microlithography, for producing an image in an image plane of an object arranged in an object plane wherein the system comprises:

• a light source emitting a projection light bundle, with at least one projection optics arranged in an optical path between its object plane and its image plane and with at least one optical correction component arranged in said optical path in front of the image plane, which in order to change optical image properties in the projection is coupled to at least one correction manipulator in such a way that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally, wherein the correction manipulator co-operates with a correction sensor device in order to determine the optical image properties in the projection, said correction sensor device comprising:
• a) a light source that emits at least one measuring light bundle that traverses at least a part of the projection optics and that lies in front of the entry to the projection optics and behind the exit from the projection optics outside the projection light bundle, and
• b) a position-sensitive correction sensor element for detecting the wave front of the at least one measuring light bundle,
• wherein one or more of the at least one optical correction component is an active mirror.

A projection exposure system, in particular for microlithography, for producing an image in an image plane of an object arranged in an object plane wherein the system comprises:

• a light source emitting a projection light bundle, with at least one projection optics arranged in an optical path between its object plane and its image plane and with at least one optical correction component arranged in said optical path in front of the image plane, which in order to change optical image properties in the projection is coupled to at least one correction manipulator in such a way that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally, wherein the correction manipulator co-operates with a correction sensor device in order to determine the optical image properties in the projection, said correction sensor device comprising:
• a) a light source that emits at least one measuring light bundle that traverses at least a part of the projection optics and that lies in front of the entry to the projection optics and behind the exit from the projection optics outside the projection light bundle, and
• b) a position-sensitive correction sensor element for detecting the wave front of the at least one measuring light bundle
• wherein the optical correction component is a at least one lens that is designed so that it can be displaced using the correction manipulator, the at least one lens being displaceable perpendicular to its optical axis.

A process for the compensation of image defects occurring in the projection optics of a projection exposure system, in particular for microlithography, comprising the steps of:

• a) providing at least one measuring light bundle guided through at least a part of the projection optics independently from the projection light bundle;
• b) measuring the optical properties of the measuring light bundle after the at least partial passage through the projection optics;
• c) measuring the wave front of the measuring light bundle in at least one of an intermediate image plane and in a plane conjugated thereto;
• d) comparing the measured value with at least one predetermined desired value;
• and
• e) adjusting the measured optical property depending on the comparison with at least one correction component influencing the optical property.

A process for the compensation of image defects occurring in the projection optics of a projection exposure system, in particular for microlithography, comprising the steps of:

• a) providing at least one measuring light bundle guided through at least a part of the projection optics independently from the projection light bundle;
• b) measuring the optical properties of the measuring light bundle after the at least partial passage through the projection optics;
• c) comparing the measured value with at least one predetermined desired value;
• d) adjusting the measured optical property depending on the comparison with at least one correction component influencing the optical property;
• e) determining a deviation between a desired reflecting surface and an actual reflecting surface of a mirror of the projection optics, from the measured values;
• f) calculating adjustment values for the actual reflecting surface;
• and
• g) shaping the actual reflecting surface corresponding to the calculated adjustment values.

A projection exposure system, in particular for microlithography, for producing an image in an image plane of an object arranged in an object plane wherein the system comprises:

• a light source emitting a projection light bundle, with at least one projection optics arranged in an optical path between its object plane and its image plane and with at least one optical correction component arranged in said optical path in front of the image plane, which in order to change optical image properties in the projection is coupled to at least one correction manipulator in such a way that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally, wherein the correction manipulator co-operates with a correction sensor device in order to determine the optical image properties in the projection, said correction sensor device comprising:
• a) a light source that emits at least one measuring light bundle that traverses at least a part of the projection optics and that lies in front of the entry to the projection optics and behind the exit from the projection optics outside the projection light bundle,
• b) a position-sensitive correction sensor element for detecting the wave front of the at least one measuring light bundle, and
• c) means for adjusting the optical properties of a measuring light bundle passing through the projection optics that takes into account expected image defects of optical components that affect the projection light bundle, but not the measuring light bundle,
• wherein the projection optics are designed so that they contain at least one intermediate image plane and that the correction sensor element lies in the intermediate image plane or in a plane conjugated thereto.

A process for the compensation of image defects occurring in the projection optics of a projection exposure system, in particular for microlithography, the projection exposure system comprising:

• a light source emitting a projection light bundle, with at least one projection optics arranged in an optical path between its object plane and its image plane and with at least one optical correction component arranged in said optical path in front of the image plane, which in order to change optical image properties in the projection is coupled to at least one correction manipulator in such a way that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally, wherein the correction manipulator co-operates with a correction sensor device in order to determine the optical image properties in the projection, said correction sensor device comprising:
• a) a light source that emits at least one measuring light bundle that traverses at least a part of the projection optics and that lies in front of the entry to the projection optics and behind the exit from the projection optics outside the projection light bundle, and
• b) a position-sensitive correction sensor element for detecting the wave front of the at least one measuring light bundle;
• wherein the projection optics are designed so that they contain at least one intermediate image plane and that the correction sensor element lies in the intermediate image plane or in a plane conjugated thereto;
• the process comprising the steps of:
• a) providing at least one measuring light bundle guided through at least a part of the projection optics independently from the projection light bundle;
• b) measuring the optical properties of the measuring light bundle after the at least partial passage through the projection optics;
• c) comparing the measured value with at least one predetermined desired value;
• and
• d) adjusting the measured optical property depending on the comparison with at least one correction component influencing the optical property, wherein the step of adjusting is performed by taking into account in addition expected image defects of optical components that affect the projection light bundle but not be measuring light bundle.