Vaporizing reactant liquids for chemical vapor deposition film processing

A vaporizer for vaporizing a liquid and mixing the vaporized liquid with a carrier gas, said vaporizer comprising:

• a valve body having a first aperture, a second aperture and a third aperture;
• a valve seat through which fluid flows;
• a gas inlet port for receiving said carrier gas, said gas inlet port connected to said first aperture through a first fluid channel;
• a liquid inlet port for receiving the liquid, said liquid inlet port connected to said second aperture through a second fluid channel;
• a valve mechanism including a valve element disposed adjacent to and opposite said valve seat, said valve element being continuously adjustable by said valve mechanism over a continuous range of settings between and including a fully closed position and a fully open position;
• and
• an outlet port connected to said third aperture through a third fluid channel,
• the valve body defining a first volume in adjustable, fluid communication with a second volume through the valve seat wherein during normal operation the pressure in the first volume is different than the pressure in the second volume.