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US 6,781,670 B2Granted
Immersion lithography
AssigneeIntel Corporation
InventorChristof Gabriel Krautschik
Life of this patent
Estimating the term…
Abstract
Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is juxtaposed between the target surface and the lens element. A projected light is directed through the lens element and the immersion liquid to image a mask on the target surface.
Claims19
An apparatus for lithograpy, comprising:
- a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface, and to image a point of a mask onto the target surface;
- and
- an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
A method for lithography, comprising:
- positioning a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface and to image a point of a mask onto the target surface;
- and
- juxtaposing an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
A lithographic system, comprising:
- a projection device operable to project light on a target surface, the projected light imaging a point of a mask onto the target surface, the projection device having characteristic resolution, the projected light having a characteristic wavelength;
- and
- a lens element comprising an immersed and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at the target surface, the immersed surface of the lens element being immersed in an immersion liquid to improve the characteristics resolution of the projection device by decreasing the characteristic wavelength as the light reaches the target surface.
Dependencies are inferred from the claim text.